{"id":34749,"date":"2022-10-01T06:00:35","date_gmt":"2022-10-01T06:00:35","guid":{"rendered":"https:\/\/dev.consapsg.com\/?p=34749"},"modified":"2026-08-13T08:59:43","modified_gmt":"2026-08-13T08:59:43","slug":"mask-aligner-ma8-class-100","status":"publish","type":"post","link":"https:\/\/cde.nus.edu.sg\/e6nanofab\/mask-aligner-ma8-class-100\/","title":{"rendered":"Mask Aligner – SUSS MA8"},"content":{"rendered":"\t\t
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Mask Aligner \u2013 SUSS MA8 <\/h2>\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t
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System Overview<\/strong><\/p>

The mask aligner operates either in contact or in proximity mode and able to handle a wide range of substrate sizes
from\u00a0small pieces up to 200mm wafers.
\u00a0<\/strong><\/p>

Available Resource<\/strong><\/p>

  • UV and DUV, AZ1512 and AZ4110<\/li>
  • Masks are not provided<\/li><\/ul>


    Technical Specifications<\/strong><\/p>

    • Able to handle substrate size of 25 mm round up to 200 mm round and
      200 x 200 mm square<\/li>
    • Capable to handle mask size ranging from 2\u201dx2\u201d up to 9\u201dx9\u201d<\/li>
    • DC lamps HG 350 W\/S, HG 500 W, HG-XE 500 W<\/li>
    • X, Y, THETA- alignment stage for motorized operation, resolution 0.1um<\/li>
    • Alignment gap programmable from 1 to 1,000 micron, resolution at 1 micron<\/li>
    • MO optics for Highest Uniformity, Diffraction reduction, Focus depth increase<\/li>
    • Substrate Conformal Imprinting Lithography (SCIL) \/ PDSM Imprinting Lithography<\/li>
    • Imprint lithography up to 150mm<\/li>
    • Wavelength: 350 to 1200 nm<\/li>
    • TSA alignment accuracy: <0.5\u03bcm<\/li>
    • BSA alignment accuracy:<1.0 um<\/li>
    • Infra-red (IR) Alignment, BSA alignment accuracy \u2264 1\u00b5m<\/li>
    • UV uniformity: +\/-3.5% for 8\u201d wafer<\/li>
    • Patterning of structures resolution below 0.8 \u03bcm<\/li>
    • Alignment accuracy down to 0.25 \u03bcm<\/li>
    • (SCIL) \/ PDSM Imprinting Lithography resolution better than 100nm<\/li><\/ul>

      \u00a0<\/strong><\/p>

      Location:\u00a0<\/strong>E6-01-03, Cleanroom, Class 10<\/p>

      Contact<\/strong>: e6nanofab@nus.edu.sg<\/p>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t<\/div>\n\t\t","protected":false},"excerpt":{"rendered":"

       <\/p>\n","protected":false},"author":4,"featured_media":29028,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"single-fullwidth.php","format":"standard","meta":{"footnotes":""},"categories":[50,52,41],"tags":[],"class_list":["post-34749","post","type-post","status-publish","format-standard","has-post-thumbnail","category-l1-cr","category-lithography-the-capabilities","category-the-capabilities"],"menu_order":2,"_links":{"self":[{"href":"https:\/\/cde.nus.edu.sg\/e6nanofab\/wp-json\/wp\/v2\/posts\/34749","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/cde.nus.edu.sg\/e6nanofab\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/cde.nus.edu.sg\/e6nanofab\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/cde.nus.edu.sg\/e6nanofab\/wp-json\/wp\/v2\/users\/4"}],"replies":[{"embeddable":true,"href":"https:\/\/cde.nus.edu.sg\/e6nanofab\/wp-json\/wp\/v2\/comments?post=34749"}],"version-history":[{"count":53,"href":"https:\/\/cde.nus.edu.sg\/e6nanofab\/wp-json\/wp\/v2\/posts\/34749\/revisions"}],"predecessor-version":[{"id":42857,"href":"https:\/\/cde.nus.edu.sg\/e6nanofab\/wp-json\/wp\/v2\/posts\/34749\/revisions\/42857"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/cde.nus.edu.sg\/e6nanofab\/wp-json\/wp\/v2\/media\/29028"}],"wp:attachment":[{"href":"https:\/\/cde.nus.edu.sg\/e6nanofab\/wp-json\/wp\/v2\/media?parent=34749"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/cde.nus.edu.sg\/e6nanofab\/wp-json\/wp\/v2\/categories?post=34749"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/cde.nus.edu.sg\/e6nanofab\/wp-json\/wp\/v2\/tags?post=34749"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}