The following functionalities allows fabrication of almost any compound (generally oxides) with unprecedented control, quality and small turnaround time. The patented beam scanning and target raster algorithm increases the appeal of this PLD system. Combinatorial spreads can be made in this system by carefully mixing different materials through an intuitive program. The use of RHEED allows us to tweak and understand thin film growth modes. Epitaxial, single crystalline, ultra-smooth thin films can be made due to the high temperature capabilities on lattice matched substrates. Common thin films fabricated in this system includes Perovskite Oxides, Superconducting Curates, Magnetic Oxides (Thulium Iron Garnet, Iron Oxide), Ferroelectric Oxides (BaTiO₃).

The following facilities for sample preparation and treatment are available:

• The variety of furnaces for sintering PLD target pellets, as well as preparing atomic flat terraced surface of single crystal substrates for subsequent film growth processes.
• The buffered hydrofluoric acid (BHF) for achieving single-terminated perovskite substrate, by selectively etching away the surface composition such as SrO.
• Combining hydrochloric acid (HCl) and potassium iodide (KI), we have effective reducing agents that is capable of chemically etch special materials such as manganites in order to define lithographic patterns.
• Ion Beam Milling that serves as physical etching to define micro- or nano-structures.
• Separate Fumehoods for BHF, common mineral acids and organic solvents are also provided for researchers to handle volatile/fuming liquids safely.