Focused Ion Beam Microscopes

Ga+ Sample Preparation FIB

FEI Helios 450S Dual Beam

The FEI Helios 450S FIB is a dual beam Ga+ ion & electron microscope with high-resolution topographical imaging and patterning capabilities. The electron beam is primarily used for surface characterization, while the ion beam is used for top-down fabrication tasks such as TEM lamella preparation, cross-section failure analysis, and nanoscale surface modification. The stability of the low voltage ion beam and chamber cleaning attachments reduces contamination and amorphization vital for S/TEM analysis.

  • Field-emission electron gun
  • LMIS: Ga ion beam (0.2–30 kV) / Tomahawk ion column
  • Spatial resolution: 0.9 nm (SEM), 4.5 nm (FIB)
  • In-lens and ETD SE detector
  • STEM detector
  • Pt & C gas injection systems
  • OmniProbe manipulator
  • Plasma cleaner / cold trap

Location: E4-02-05

Chung JingYang
jy.chung@nus.edu.sg

Ga+ Large-chamber FIB

FEI Versa 3D Dual Beam

The Versa 3D DualBeam FEG FIB-SEM combines a focused Ga ion beam with a high-resolution field-emission electron gun. Owing to a large chamber allowing up to 6" industry wafers with full rotation, the Versa 3D provides enhanced 2D and 3D materials characterization and analysis for a wide range of material science and industry-related samples. This FIB is particularly useful as a high-throughput microscope for APT sample preparation.

  • Field-emission electron gun
  • LMIS: Ga ion beam (0.5–30 kV) / Sidewinder ion column
  • Spatial resolution: 1.2 nm (SEM)
  • ETD SE detector
  • Pt & C gas injection systems
  • EasyLift manipulator
  • 150 mm maximum sample size

Location: E4-02-05

Chung JingYang
jy.chung@nus.edu.sg

He+/Ne+ High-resolution FIB

Zeiss Orion NanoFab

The Orion NanoFab Helium Ion Microscope (HIM) operates using ionized Helium or Neon gases rather than electrons for imaging and milling of materials. With the significantly smaller interaction volume, alongside the smaller de Broglie wavelength, the HIM can achieve finer spatial resolution and larger depth-of-field compared to a FE-SEM. Nanomachining fabrication with sub-10 nm feature sizes is achievable through lighter He ions, while faster milling is operated through heavier Ne ions.

  • GFIS: He ion beam (10–30 kV), Ne ion beam (10–25 kV)
  • Spatial resolution: 0.5 nm (He+), 1.9 nm (Ne+)
  • ETD SE detector
  • Electron flood gun
  • Chamber plasma cleaner
  • 80 mm loadlock

Location: E4-02-15

Ashley Xu
xyue20@u.nus.edu

Scanning Electron Microscopes

Field-emission SEM

JEOL JSM-IT800 SHL

The JEOL IT800 SEM has a Schottky field-emission source, and utilizes hybrid magnetic and electrostatic objective lenses, allowing for high spatial resolution at low accelerating voltages. It offers various observation modes, including beam deceleration — and together with its wide range of in-lens and chamber detectors — enables high-contrast imaging across a wide range of materials. A controlled atmosphere transfer solution is available, which allows the imaging of beam and air sensitive samples.

  • Field-emission electron gun
  • Hybrid magnetic and electrostatic lenses (SHL model)
  • Spatial resolution: 0.5 nm (15 kV), 0.7 nm (1 kV), 0.9 nm (0.3 kV)
  • Acceleration voltage: 0.01–30 kV
  • Stage bias: 0.1–2 kV
  • Probe current: Up to 300 nA
  • In-lens and chamber SE detectors
  • In-lens and segmented chamber BSE detectors
  • Chamber plasma cleaner
  • Oxford Ultim Max 170 mm2 EDX
  • RAITH ELPHY Plus nanolithography system

Location: E3A-05-12

Shen Jingjing
shenjj2@nus.edu.sg

Field-emission SEM

Zeiss Sigma 300

The Zeiss Sigma 300 is a field-emission SEM able to perform high resolution imaging with secondary and backscattered electrons. It has the function to operate under high and low pressure conditions, allowing the imaging of specimens that are poorly conductive or specimens that cannot be imaged under vacuum.

  • Field-emission electron gun, GEMINI column
  • Spatial Resolution: 1 nm (15 kV)
  • Acceleration Voltage: 0.02–30 kV
  • Probe current: 3–20 nA
  • ETD SE, in-lens SE detector, retractable BSE detector
  • High/low vacuum
  • Oxford Ultim Max 65 mm2 EDX

Location: E3A-05-12

Shen Jingjing
shenjj2@nus.edu.sg