3D TWO-PHOTON LITHOGRAPHY PRINTER – NANOSCRIBE GT2

System Overview

3D TWO-PHOTON LITHOGRAPHY PRINTER – NANOSCRIBE GT2
3D TWO-PHOTON LITHOGRAPHY PRINTER – NANOSCRIBE GT2

 

Photonic Professional GT2 is a high resolution 3D printer designed for ultra-precise and rapid scientific microfabrication. Nanoscribe’s Photonic Professional GT2 uses Two-Photon Polymerization (2PP) to produce filigree structures of nearly any 3D shape by high-precision 3D printing: crystal lattices, porous scaffolds, naturally inspired patterns, smooth contours, sharp edges, undercuts and bridges are all manufacturable with high resolution. More than a thousand successful research projects by Nanoscribe customers and system users are evidence of the power of two-photon lithography.

Technical specifications

  • Printing technology Layer-by-layer Two-Photon Polymerization
  • Minimum XY feature size 160 nm typical; 200 nm specified*
  • Finest XY resolution 400 nm typical; 500 nm specified*
  • Finest vertical resolution 1,000 nm typical; 1,500 nm specified*
  • Layer distance variable, 0.1 – 5.0 µm*
  • Maximum object height 8 mm*
  • Build volume 100 × 100 × 8 mm³ *
  • Minimum surface roughness Ra ≤ 20 nm*
  • Max. scan speed from 100 to 625 mm/s*

 * Values may vary depending on the Solution Set, objective or photoresin in use


Location:
E6-02-09, Class 10000

Contact: e6nanofab@nus.edu.sg