MICROWRITER- DURHAM MAGNETO OPTICS ML3 PRO (CLASS 10) System OverviewThe MicroWriter ML3 Pro is a sub-micron lithography machine. Technical Specifications• Maximum substrate size: 9”x 9”• Maximum write area: 8”x 8”• Minimum substrate size: 1cm x 1cm• Substrate thickness: 0 – 10 mm• Motion stage minimum XY step size: 4nm• Maximum resolution: 0.6µm• Surface tracking autofocus, automatic lens changer for exposure resolution and alignment microscope• Optical surface profiler Z resolution: 100nm• Exposure wavelength: 365nm and 405nm• Maximum writing speed: 50 mm2/minute at 1 µm & 15 mm2/minute at 0.6 µm• Overlay alignment accuracy at best resolution: ± 0.5µm• Mask design software: Clewin supplied Location: E6-01-03, Class 10 CleanroomContact: e6nanofab@nus.edu.sg