System Overview

Xenon Difluoride etcher is a kind of vapor etcher where reactive gas spontaneously reacts with a material in vapor phase.

This XeF2 can etch Si and Ge isotropically and offers excellent selectivity to various materials such as Al, SiO2, Si3N4 and photoresist.

Location:  L2 Dry Lab

Contact: e6nanofab@nus.edu.sg