Etching is a process for pattern transfer and surface treatment in micro-nano device fabrication.  E6NanoFab makes available dry and wet etching systems to support the diverse process requirement.

Dry Etching

Multi-chamber cluster tools such as ICP plasma etching and ion beam milling provide strong dry etching capabilities for various materials such as Si, III-V & III-N, oxides, metals, polymers and others.

Wet Etching

Our dedicated wet-benches support several wet processes such as RCA, standard cleaning, and orientation dependent Si KOH etching.