- Deposition and Growth
- Annealing Process
- Magnetic Processing
- Lithography
- Electron Beam Lithography – Ellionix
- Laser Writer – Hiedelberg (Class 10)
- Microwriter- Durham Magneto Optics Ml3 Pro (Class 10)
- Mask Aligner MA8 (Class 100)
- Mask Aligner MA6 (Class 10K)
- Wet Processing (Class 10K)
- Solvent Wet Bench (Class 10)
- Spin Coater (Class 100)
- Hot Plate (Class 10)
- Baking Oven (Class 10K)
- Etching
- BEOL and Packaging
- Characterisation and Metrology
- Others
- Tool Booking
ETCHING
Etching is a process for pattern transfer and surface treatment in micro-nano device fabrication. E6NanoFab makes available dry and wet etching systems to support the diverse process requirement.
Dry Etching
Multi-chamber cluster tools such as ICP plasma etching and ion beam milling provide strong dry etching capabilities for various materials such as Si, III-V & III-N, oxides, metals, polymers and others.
Wet Etching
Our dedicated wet-benches support several wet processes such as RCA, standard cleaning, and orientation dependent Si KOH etching.