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MBE
By DEPOSITION AND GROWTH DL Deposition MBE The Capabilities

28 Dec: Molecular Beam Epitaxy (MBE) System for the Growth of a Range of Group III-V/II-IV Materials

 

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ICP_E6-05-09 (Demo)
By ETCHING L5 CR The Capabilities

28 Dec: Integrated ICP Etch Clustering System

 

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L1-CR_AJA-EBeam
By DEPOSITION AND GROWTH L1 CR The Capabilities

26 Dec: Ultra High Vacuum E-Beam Evaporation

 

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L1 CR_AJA Sputter (Demo)
By DEPOSITION AND GROWTH L1 CR The Capabilities

25 Dec: Ultra High Vaccum Metal and Dielectric Sputtering

 

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L1 CR_Magest_S200_Sputter E6-01-02 (Demo)
By L1 CR MAGNETIC PROCESSING The Capabilities

24 Dec: Magest S200 Multi Chamber Sputtering System

 

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Picosun ALD photo1-cropped
By DEPOSITION AND GROWTH L5 CR The Capabilities

28 Nov: Atomic Layer Deposition (ALD)

 

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PECVD_E6-05-09 (Demo)
By DEPOSITION AND GROWTH L5 CR The Capabilities

28 Nov: Plasma Enhanced Chemical Vapour Deposition (PECVD)

 

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Edward
By DEPOSITION AND GROWTH DL Deposition Dry Lab Wet Lab

24 Nov: E-Beam Evaporator

 

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L5 Wirebonder (Demo)
By BEOL DL BEOL

24 Nov: Wire Bonder

 

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L3 Accretech Wafer Dicer (Demo)
By BEOL DL BEOL

24 Nov: Wafer Dicer

 

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E6NanoFab

  • 6601 8522 | 6601 6048
  • e6nanofab@nus.edu.sg
Office Address

Block E6, Level 5, E6-05-03
5 Engineering Drive 1, Singapore 117608

Mailing Address

c/o Department of Electrical and Computer Engineering
4 Engineering Drive 3, Block E4, # E4-5-42 Singapore 117583