By ETCHING L5 CR The Capabilities Inductively Coupled Plasma Reactive Ion Etcher (ICP RIE) – Oxford PlasmaPro 100 Cobra
By Characterisation and Metrology L5 CR MATERIAL CHARACTERIZATION AND PROCESS CONTROL Ellipsometer – Semilab SE-2000
By DEPOSITION AND GROWTH L5 CR The Capabilities Inductively Coupled Plasma Reactive Ion Etcher – Oxford PlasmaPro 100 Cobralon
By L1 CR MATERIAL CHARACTERIZATION AND PROCESS CONTROL Optical Microscope – Nikon Eclipse L200N / Keyence VHX
