Facilities
Advanced Materials Characterization:
The state-of-the-art research facilities in the Department of Materials Science and Engineering enable comprehensive material analysis, ranging from atomic ordering and precise chemical composition to thermal, optical, mechanical, structural, and electronic properties, as well as detailed microstructural characterization at the atomic level.

STEM:
The highest-resolution microscopy technique. It can image and generate elemental maps at atomic resolution, using a focused <0.1 nm electron beam that scans across a thin sample.

FIB:
Used for making cross-sectional samples. An electron beam and ion beam are combined in one instrument, with the focused ion beam able to very locally sputter (remove) material, exposing the underlaying layers.

HRTEM:
Transmission electron microscopes are used for imaging materials at almost atomic resolution. TEMs can also image electron diffraction patterns, to precisely measure the local atomic structure of a material.

SEM:
The Scanning Electron Microscope uses a gentle electron beam to precisely image the top surface of a material, and to map the local elemental composition.

XRD:
X-ray diffraction is the most accurate technique for learning about the way atoms are ordered in materials: are they amorphous or crystalline, and how exactly are the atoms ordered in the crystals?

SAXS:
X-ray diffraction with a wide field of view. Can accurately measure the atomic ordering of non-powder samples with large crystals, and of particle suspensions.
Equipment Name / Service Description |
Equipment Location | MSE Internal Charge Rate (run by user) |
NUS Internal Charge rate (run by user) | NUS Internal Charge Rate (run by LO) |
Outside NUS Charge Rate (run by LO) |
Contact Person |
|
---|---|---|---|---|---|---|---|
 |  | $/hr | $/hr | $/hr | $/hr |  | |
TEM JEOL 3010F | Blk E4 #02-02 |
50 (excluding consumables) |
100 (excluding consumables) |
300 (excluding consumables) |
450 | Yang Fengzhen | mseyf@nus.edu.sg |
TEM JEOL 2800 | Blk E7 Level 1 |
70 (excluding consumables) |
150 (excluding consumables) |
300 (excluding consumables) |
500 | Yang Fengzhen | mseyf@nus.edu.sg |
TEM JEOL 2010F | Blk E4 #02-02 |
50 (excluding consumables) |
100 (excluding consumables) |
300 (excluding consumables |
500 | Yang Fengzhen | mseyf@nus.edu.sg |
Raman Spectrometer, Horiba Labram | Blk E3A #05-08 |
25 | 80 | 120 | 200 | Serene Chooi | mseckms@nus.edu.sg |
Scanning Electron Microscope (SEM); Zeiss Sigma 300 | Blk E3A #05-11A |
40 | 90 | 180 | 220 | Shen Jingjing | shenjj2@nus.edu.sg |
High Temperature Furnaces |
Blk E3A #05-04 |
15 (or 40/day) | 40 | 40 | Not available | Alaric Wong | alaricw@nus.edu.sg |
Malvern ZetaSizer Nano | Blk E3A #05-10 |
15 | 40 | 60 | 150 per sample | Shen Jingjing | shenjj2@nus.edu.sg |
Micromeritics ASAP Surface Area and Porosity Analyzer |
Blk E3A #05-10 |
75/day | 300/day | 800/day | 1400 per day | Shen Jingjing | shenjj2@nus.edu.sg |
Powder XRD, Bruker D8 Advance | Blk E3A #05-15 |
35 | 120 | 160 | 180 | Chen Qun | msechenq@nus.edu.sg |
Thin Film XRD, Bruker D8 Advance | Blk E3A #05-15 |
35 | 120 | 160 | 180 | Chen Qun | msechenq@nus.edu.sg |
Non ambient temperature Powder XRD, PANalytical X'Pert PRO |
Blk E3A #05-15 |
40 | 120 | 180 | 220 | Chen Qun | msechenq@nus.edu.sg |
High resolution XRD; Bruker D8 Discover | Blk E3A #05-15 |
35 | 120 | 160 | 180 | Chen Qun | msechenq@nus.edu.sg |
Small-angle X-ray scattering system (SAXS), Xenocs 2.0 | Blk E3A #05-15 |
40 | 120 | 160 | 200 | Chen Qun | msechenq@nus.edu.sg |
Step profiler KLA Tencor Alpha-Step IQ (step height measurement only) | Blk E3A #05-08 |
10 | 25 | 40 | 50 per hr + 30 per sample |
Henche Kuan | msehk@nus.edu.sg |
Vibrating-sample magnetometer (VSM), Lake Shore 7407 | Blk E3A 05-01 |
60 | 90 | 120 | 150 | Chen Qun | msechenq@nus.edu.sg |
Hall Effect Measurement System | Blk E3A #05-07 |
30 | 90 | 120 | 150 | Chen Qun | msechenq@nus.edu.sg |
Polarizing Microscope w Heating Stage | Blk E3A #05-07 |
15 | 30 | 50 | 80 | Chen Qun | msechenq@nus.edu.sg |
DSC (Differential Scanning Calorimetry) TA Instruments DSC 25 | Blk E3A #05-08 |
15 (excluding consumables) |
40 (excluding consumables) |
60 (excluding consumables) |
80 per hr + 80 per sample |
Henche Kuan | msehk@nus.edu.sg |
TGA (Thermogravimetry Analysis) TA Instruments TGA Q50 or Q500 |
Blk E3A #05-08 |
15 (excluding consumables) |
40 (excluding consumables) |
60 (excluding consumables) |
80 per hr + 80 per sample |
Henche Kuan | msehk@nus.edu.sg |
FTIR spectrometer Perkin-Elmer Spectrum Two |
Blk E3A #05-06 | 15 | 30 | 40 | 60 per hr + 80 per sample | Henche Kuan | msehk@nus.edu.sg |
Fluorescence spectrometer Perkin-Elmer FL-6500 |
Blk E3A #05-06 | 15 | 30 | 40 | 60 per hr + 80 per sample | Henche Kuan | msehk@nus.edu.sg |
UV-VIS-NIR spectrometer Agilent Cary 5000 | Blk E3A #05-06 | 15 | 30 | 40 | 60 per hr + 80 per sample | Henche Kuan | msehk@nus.edu.sg |
UV-Vis spectrometer Shimadzu UV-1900 | Blk E3A #05-06 | 10 | 25 | 40 | 50 per hr + 60 per sample | Henche Kuan | msehk@nus.edu.sg |
FTIR spectrometer Agilent Cary 660 | Blk E3A #05-06 | 15 | 30 | 40 | 60 per hr + 100 per sample |
Henche Kuan | msehk@nus.edu.sg |
Stylus profilometer Bruker Dektak-XT | Blk E3A #05-08 | 10 | 25 | 40 | 50 per hr + 30 per sample | Henche Kuan | msehk@nus.edu.sg |
UV-Vis spectrometer with integrating sphere Shimadzu UV-2600i | Blk E3A #05-06 | 15 | 30 | 40 | 60 per hr + 80 per sample | Henche Kuan | msehk@nus.edu.sg |
Four-point Probe | Blk E3A #05-07 |
10 (excluding consumables) |
20 (excluding consumables) |
30 (excluding consumables) |
40 per hr + 40 per sample |
Chan Yew Weng | msecyw@nus.edu.sg |
Universal Testing Machine, Lloyd | Blk E3A #05-07 |
10 | 30 | 45 | 150 | Chan Yew Weng | msecyw@nus.edu.sg |
Polishing Machine | Blk E3A #05-02 |
5 | 15 | 45 | 150 | Chan Yew Weng | msecyw@nus.edu.sg |
Metallurigical Microscope | Blk E3A #05-02 |
10 | 20 | 45 | 150 | Henche Kuan | msehk@nus.edu.sg |
Hardness Tester, Indentec |
Blk E3A #05-07 |
10 | 30 | 50 | 60 per sample | Chan Yew Weng | msecyw@nus.edu.sg |